An ion and electron beams multifunction equipment for materials surface treating
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An ion and electron beams multifunction equipment for materials surface treating
Nuclear TechniquesVol. 11, Issue 8, (1988)
作者机构:
四川大学原子核科学技术研究所
作者简介:
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DOI:
CLC:
Received:30 March 1987,
Published:1988-08
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Ningkang Huang, Minghua Wang, Yong Shen, et al. An ion and electron beams multifunction equipment for materials surface treating[J]. Nuclear techniques, 1988, 11(8): 33-37.
DOI:
Ningkang Huang, Minghua Wang, Yong Shen, et al. An ion and electron beams multifunction equipment for materials surface treating[J]. Nuclear techniques, 1988, 11(8): 33-37.DOI:
An ion and electron beams multifunction equipment for materials surface treating
Described is an equipment consisting of several systems as follows: an ion system
having a sputtering ion source and an asymmetric three electrode acceleration tube
operated at 50 keV with a beam current up to 4 mA (for N
+
) ; an electron beam system operated at up to 45 keV with beam power densities of 10
2
-10
6
W/cm
2
; a microcomputer device for electron beam deflecting; a magnetron sputtering device capable of easily altering the targ materials and a large high vacuum work chamber (500×1600 mm) with rotary
translation and up-down mechanical scannings
A variety of surface treating (ion implantation
ion mixing
electron beam glazing and alloying
magnetron sputtering ion plating etc.) can be made with this equipment. Several experiments have proved that this equipment is versatile for materials
surface modification and preparation of solid films.
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references
B. Y. Tsaur et al . , Appl. Phys. Lett. , 36 ( 1980 ), 10 : 823 .