Effects of UV light illumination on track etching in polycarbonate

DUAN Jinglai1; 2 LIU Jie1 ZHU Zhiyong3 WANG Zhiguang1 SUN Youmei1 HOU Mingdong1 JIN Yunfan1 YAO Huijun1; 2 SONG Yin1 ZHAO Zhiming1; 2 YAO Cunfeng1; 2 1

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Effects of UV light illumination on track etching in polycarbonate

更新时间：2021-03-12

- Effects of UV light illumination on track etching in polycarbonate
- NUCLEAR TECHNIQUES Issue 9, (2005)
- 作者机构：
  
  1. 中国科学院近代物理研究所
  2. 中国科学院上海应用物理研究所
  3. 中国科学院近代物理研究所兰州730000 中国科学院研究生院北京,100049
  4. ,上海,201800
- 作者简介：
- 基金信息：
  
  中国科学院“西部之光”基金和国家自然科学基金(10375079)资助
- DOI：
  CLC： O571.6
- Published：01 September 2005
- 稿件说明：
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[1]段敬来,刘杰,朱智勇,王志光,孙友梅,侯明东,金运范,姚会军,宋银,赵志明,姚存峰.电导法研究紫外光预辐照对核孔膜径迹蚀刻的影响[J].核技术,2005(09):684-687.

DUAN Jinglai1, 2 LIU Jie1 ZHU Zhiyong3 WANG Zhiguang1 SUN Youmei1 HOU Mingdong1 JIN Yunfan1 YAO Huijun1, 2 SONG Yin1 ZHAO Zhiming1, et al. Effects of UV light illumination on track etching in polycarbonate[J]. Nuclear techniques, 2005, (9): 684-687.
[1]段敬来,刘杰,朱智勇,王志光,孙友梅,侯明东,金运范,姚会军,宋银,赵志明,姚存峰.电导法研究紫外光预辐照对核孔膜径迹蚀刻的影响[J].核技术,2005(09):684-687. DOI：

DUAN Jinglai1, 2 LIU Jie1 ZHU Zhiyong3 WANG Zhiguang1 SUN Youmei1 HOU Mingdong1 JIN Yunfan1 YAO Huijun1, 2 SONG Yin1 ZHAO Zhiming1, et al. Effects of UV light illumination on track etching in polycarbonate[J]. Nuclear techniques, 2005, (9): 684-687. DOI：

摘要

利用紫外光辐照聚碳酸酯（PC）离子径迹膜

研究光辐照对于核孔膜蚀刻过程的影响。实验结果显示

紫外光照射对核孔膜的蚀刻有着重要的作用

它可以有效地增加径迹的蚀刻速率

并且径迹蚀刻速率随紫外光照时间的增加呈线性增长关系

此现象是由于光降解作用引起的。本文还介绍了用于监测核孔膜蚀刻过程的电导测量方法

利用此方法可以得出核孔膜径迹蚀刻速率、孔径随蚀刻时间变化等关系。

Abstract

Nuclear track membranes offer distinct advantages over conventional membranes due to their precisely determined structure. Their pore size

shape and density can be controlled intentionally so that a membrane with the required characteristics can be produced. The track etching technology plays a most important role in the production of nuclear track membranes. The effects of pretreatment using UV light illumination on track etching of polycarbonate (PC) track membranes were investigated in this work. PC films illuminated by UV light showed a strong enhancement in the track etching rate. Furthermore

the track etching rate had a linear increase with illumination time. The phenomenon is attributed to the oxygen-assisted photo-degradation through generating new photo-unstable species. In this paper

the conductance measurement is also presented

which is a popular method used in etching technology.

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