Qingping Han, Weichang Lu, Huijuan Su, et al. The mechanism of uranium adsorption on Resin 508 and isoelectric point of the resin[J]. Nuclear techniques, 1990, 13(5): 269-273.
Qingping Han, Weichang Lu, Huijuan Su, et al. The mechanism of uranium adsorption on Resin 508 and isoelectric point of the resin[J]. Nuclear techniques, 1990, 13(5): 269-273.DOI:
In this paper the adsorption process of uranium by Resin 508 at the solid-liquid interface was investigated and the mechanism of uranium adsorption including adsorption dynamics
adsorption thermodynamics and isoelectric point of resin was studied. The results are as follows: The maximum of uranium adsorption is attained at pH5-7;Uranium adsorption isotherm by Resin 508 in experimental conditions agrees with Langmuir's adsorption isotherm
the maximum of uranium adsorbed (Vm) is 716 mgU/g-dried resin; The adsorption of uranium by Resin 508 is an endothermic reaction and
ΔH
=16.87kJ/mol; The exchange-adsorption rate is mainly controlled by liquid film diffusion; The isoelectric points of Resin 508 before and after uranium adsorption are found to be pH 7.5 and pH 5.7 respectively. It is a specific adsorption for uranium.
关键词
Keywords
references
韩庆平 等 , 华东师范大学学报 ,( 1985 ), 1 : 73 。
吴玲 等 , 华东师范大学学报 ,( 1982 ), 1 : 75 。
Giles. C. H ., J. Colloid Interface Sci. , 47 ( 1974 ), 755 .