离子束增强沉积法制备Mo2N和Mo2-xTixN薄膜及其结构与性能研究

刘邦治; 李国卿; 牟宗信; 张家良; 崔岩; 黄宁表; 何浩培

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离子束增强沉积法制备Mo₂N和Mo_2-xTi_xN薄膜及其结构与性能研究

更新时间：2021-03-12

- 离子束增强沉积法制备Mo₂N和Mo_2-xTi_xN薄膜及其结构与性能研究
- Synthesis of Mo₂N and Mo_2-xTi_xN thin films by ion beam enhanced deposition method and their structure and properties
- 核技术 2000年第7期
- 作者机构：
  
  1. 大连理工大学三束材料改性国家重点实验室,大连,116024
  2. ,香港
- 作者简介：
- 基金信息：
- DOI：
  中图分类号： O484
- 纸质出版日期：2000-07-01
- 稿件说明：
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[1]刘邦治,李国卿,牟宗信,张家良,崔岩,黄宁表,何浩培.离子束增强沉积法制备Mo_2N和Mo_(2-x)Ti_xN薄膜及其结构与性能研究[J].核技术,2000(07):483-487.

Synthesis of Mo₂N and Mo_2-xTi_xN thin films by ion beam enhanced deposition method and their structure and properties[J]. Nuclear techniques, 2000, (7): 483-487.
[1]刘邦治,李国卿,牟宗信,张家良,崔岩,黄宁表,何浩培.离子束增强沉积法制备Mo_2N和Mo_(2-x)Ti_xN薄膜及其结构与性能研究[J].核技术,2000(07):483-487. DOI：

Synthesis of Mo₂N and Mo_2-xTi_xN thin films by ion beam enhanced deposition method and their structure and properties[J]. Nuclear techniques, 2000, (7): 483-487. DOI：

摘要

分别采用氮离子束增强沉积和N－Ti离子束同步增强沉积工艺制备了Mo

N和Mo

2-x

TixN薄膜，用XRD、TEM、划痕和阳极极化方法研究了两者的结构与性能。结果表明，N－Ti离子束同步增强沉积工艺制备的Mo

2-x

N薄膜的膜基结合力、致密性和抗腐蚀性能均优于氮离子增强沉积的Mo

N薄膜，Mo

2-x

N薄膜划痕临界载荷达3000gf，比Mo

N薄膜提高一倍。自腐蚀电位从Mo

N薄膜的32mV提高到Mo

2-x

N薄膜的166mV，自腐蚀电流相应地从0.5μA/cm

减小到0．26μA/cm

。Mo

2-x

TixN薄膜的结构是Mo

N的f.c.c结构。

Abstract

Some Mo2N and Mo2-xTixN films were synthesized by N ion beaxn enhanced deposition and synchronized N-Ti ion beams enhanced deposition methods respectively. The microstructure of the films was determined to be of γ -Mo2N phase by the X-ray diffraction and transmission electron diffraction experiments. The scratch tests demonstrated that the metal ion beam could effectively improve adhesion of the films. The scratch critical loading of the Mo2-xTixN film was measured to be about 3000 gf

which is about twice as large as that of the Mo2N film.The corrosion resistance of the films was analyzed by the anode polarizing tests. The corrosion-self voltage and corrosion-self current of the Mo2N film and the Moz-xTixN film in a 0.5mol/L H2SO4 solution were found to be 32mV

0.5 p A/cm2 and 166mV

0.26 μA/cm2 respectively. These results indicated that the corrosion resistance of the Mo2-xTixN film was much better than that of the Mo2N film.

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