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兰州空间技术物理研究所 真空技术与物理重点实验室 兰州 730000
[ "安恒, 男, 1982年出生, 2010年于山东大学获硕士学位, 研究领域为空间辐射效应及新型有效载荷技术", "AN Heng, male, born in 1982, graduated from Shandong University with a master’s degree in 2010, focusing on space radiation effect andpayload" ]
收稿日期:2017-02-01,
修回日期:2017-04-11,
纸质出版日期:2017-07-10
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安恒, 杨生胜, 苗育君, 等. CMOS APS光电器件单粒子效应电荷收集特性仿真分析[J]. 核技术, 2017,40(7):070502
Heng AN, Shengsheng YANG, Yujun MIAO, et al. Simulation of characteristic of charge collecting for CMOS APS with single event effects[J]. Nuclear techniques, 2017, 40(7): 070502
安恒, 杨生胜, 苗育君, 等. CMOS APS光电器件单粒子效应电荷收集特性仿真分析[J]. 核技术, 2017,40(7):070502 DOI: 10.11889/j.0253-3219.2017.hjs.40.070502.
Heng AN, Shengsheng YANG, Yujun MIAO, et al. Simulation of characteristic of charge collecting for CMOS APS with single event effects[J]. Nuclear techniques, 2017, 40(7): 070502 DOI: 10.11889/j.0253-3219.2017.hjs.40.070502.
卫星在轨飞行期间,星载电子器件将不可避免地遭受空间带电粒子的辐射,随着半导体技术的不断进步,电子器件的单粒子效应敏感性越来越高,已经成为一个影响其可靠性的重要因素。互补金属氧化物半导体(Complementary Metal Oxide Semiconductor Active Pixel Sensor
CMOS APS)光电器件因其低功耗、小体积和微重量的优点已成为遥感卫星成像的重要发展方向。为获取CMOS APS光电器件在遭受带电粒子辐射后性能变化的特征,在分析SOI MOSFET(Silicon on Insulator Metal-Oxide-Semiconductor Field-Effect Transistor)结构和特性的基础上,通过理论分析和数值模拟,分析了重离子在CMOS APS光电器件中引起的辐射损伤,分析晶体管和光电二极管的电荷收集机理。通过TCAD(Technology Computer Aided Design)模拟了电荷收集过程,分析了影响漏电流变化的直接因素,获得了重离子LET(Linear Energy Transition)值、入射位置以及器件偏置电压与漏电流的相互关系,为后续CMOS APS的重离子模拟试验以及抗辐射加固设计提供了理论支撑。
Background
2
Complementary metal oxide semiconductor active pixel sensor (CMOS APS) with less energy consumption
small volume and less weight is already a major development direction of imaging for remote sensing satellites. During the satellites flying on orbit
electron devices are exposed in space radiation
and degraded by space charged particles. Along with the improvement of semiconductor technology
sensibility of single event effect is more obvious
and is a key factor of reliability.
Purpose
2
This study aims to obtain the characteristics of CMOS APS subjected to charged particles.
Methods
2
Based on analysis of structure and characteristic of silicon on insulator metal-oxide-semiconductor field-effect transistor (SOI MOSFET)
radiation damage of CMOS APS irradiated by heavy ions is discussed using the method of theoretical analysis and numerical simulation. And charge collect mechanism of the transistor and photodiode is also analyzed.
Results
2
The procedure of charge collecting is simulated by technology computer aided design (TCAD)
and obtained the relationship between the leakage current and linear energy transition (LET)
incidence position of heavy ion
offset voltage.
Conclusion
2
The result could be used for CMOS APS's single event effect and also provide theoretical guide for the design of radiation hardening.
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